Chemical etching
Introduction
Chemicaletching
Etchingisatechniquethatremovesmaterialsbychemicalreactionorphysicalimpact.
Etchingtechniquescanbedividedintotwotypes:"wetetching"and"dryetching".
Usuallyreferredtoasetchingisalsoknownasphotochemicaletching,whichreferstotheremovaloftheprotectivefilmoftheareatobeetchedafterexposure,platemakinganddevelopment,andcontactwithchemicalsolutionsduringetchingtoachievetheeffectofdissolvingandcorroding.Theeffectofconcave-convexorhollowmolding.
Itwasfirstusedtomanufacturecopperplate,zincplateandotherprintingconcave-convexplates.Itisalsowidelyusedintheprocessingofweightreductioninstrumentpanel,famousbrandandthinworkpiecesthataredifficulttoprocessbytraditionalprocessingmethods.Aftercontinuousimprovementanddevelopmentofprocessequipment,itcanalsobeusedintheprocessingofprecisionetchingproductsofelectronicthinpartsintheaviation,machinery,andchemicalindustries.Especiallyinthesemiconductormanufacturingprocess,etchingisanindispensabletechnology.
Forexample,thekeyboardofMotoV3,thetextandsymbolsareallformedbyhollowetchingprocess.
Process
Process:cleaningplate(stainlesssteelandothermetalmaterials)---drying---coating---exposing---developing---etching---release
Chemicalprocessingofglasssurface
Usehydrofluoricacidtocorrodethepartialsurfaceofglassproducts,anddepictvariouspatterns,patternsandscalesonthesurface,Grid,etc.Thechemicaletchingprocessistocoatthesurfaceoftheglassthatneedstobeetchedwithprotectivepaintorparaffinwax.ThenputinanetchingsolutioncomposedofhydrofluoricacidandasmallamountofNH4F,theglasssurfacelayerreactswithhydrofluoricacid,andthegeneratedfluorideisdissolvedintheetchingsolutionordepositedontheglasssurface.
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